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Photoresist Method and Composition for Top Surface Imaging

IP.com Disclosure Number: IPCOM000105318D
Original Publication Date: 1993-Jul-01
Included in the Prior Art Database: 2005-Mar-19
Document File: 2 page(s) / 59K

Publishing Venue

IBM

Related People

Aviram, A: AUTHOR [+4]

Abstract

The well documented photo reaction of amines or electron rich molecules with haloalkanes such as CCl sub 4 , CBr sub 4 , CI sub 3 H , (ref. R. H. Sprague et. al., Phot. Sci. Eng. 8, 91 (1961); R. H. Sprague et. al, ibid 9, 133 (1965)), has been shown in our laboratory that it can serve as the basis of a new photolithographic technique. This reaction can be formulated as

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Photoresist Method and Composition for Top Surface Imaging

      The well documented photo reaction of amines or electron rich
molecules with haloalkanes such as
 CCl sub 4 ,  CBr sub 4 ,  CI sub 3 H , (ref.  R. H. Sprague et.
al., Phot.  Sci.  Eng.  8, 91 (1961); R. H.  Sprague et.  al, ibid 9,
133 (1965)), has been shown in our laboratory that it can serve as
the basis of a new photolithographic technique.  This reaction can be
formulated as

               D + CBr sub 4  + UV --->  D sup +.   Br sup -

      The usefulness of this photo reaction to microlithography
applications has been enhanced by our discovery that imaged films
made of a polymer binder containing on or more of the photoactive
components which can be chosen from the following partial listing of
possible compounds, DEASP, Styril Dye, Vinilidene Dye, and Leuco
Triphenylmethyl dyes, etch differently by Reactive Ion Etching (RIE)
or Ion Milling (IM) in photo-exposed areas vs.  unexposed areas.
light exposure followed by RIE etching produces a negative image.

      The components can be mixed in a common solvent prior to the
film casting or spinning.  We found that the solutions have limited
shelf life and intense coloration occurs within hours or days,
depending on the composition.  Therefore we introduced the novel
technique of top layer activation prior to light exposure.  According
to this procedure, we preferred to cast the film from a solution that
contained the donor compound "D" and the polymer binder with a
composition of 10-50 %.  and subject the dry (namely solve...