Browse Prior Art Database

Aerodynamic Mask Processing Chuck Round Design to Hold Square Mask

IP.com Disclosure Number: IPCOM000105835D
Original Publication Date: 1993-Sep-01
Included in the Prior Art Database: 2005-Mar-20
Document File: 2 page(s) / 32K

Publishing Venue

IBM

Related People

Strautin, CE: AUTHOR

Abstract

A round mask processing chuck is described which is designed to reduce aerodynamic turbulence while holding square masks used for semiconductor wafer processing. Conventional square mask chucks have arms that create turbulence when the chuck and mask rotate at high speeds. Turbulence is undesirable since it causes non-uniform spray patterns that contribute to processing defects. Details of the round chuck are shown in the figure. A square recess in the chuck is the proper size to fit the mask. Four small tabs in each corner of the recess support the mask at such a depth that the top surface of the mask is in the same plane as the top of the chuck. By supporting the mask only at the corners, temperature gradients across the mask are minimized.

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Aerodynamic Mask Processing Chuck Round Design to Hold Square Mask

      A round mask processing chuck is described which is designed to
reduce aerodynamic turbulence while holding square masks used for
semiconductor wafer processing.  Conventional square mask chucks have
arms that create turbulence when the chuck and mask rotate at high
speeds.  Turbulence is undesirable since it causes non-uniform spray
patterns that contribute to processing defects.  Details of the round
chuck are shown in the figure.  A square recess in the chuck is the
proper size to fit the mask.  Four small tabs in each corner of the
recess support the mask at such a depth that the top surface of the
mask is in the same plane as the top of the chuck.  By supporting the
mask only at the corners, temperature gradients across the mask are
minimized.  The combination of low turbulence and minimal temperature
gradients yields uniform processing that is comparable to that
achieved with round masks.