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Mask Process Chamber Used to Develop and/or Wet Etch Masks

IP.com Disclosure Number: IPCOM000105887D
Original Publication Date: 1993-Sep-01
Included in the Prior Art Database: 2005-Mar-20
Document File: 2 page(s) / 57K

Publishing Venue

IBM

Related People

Strautin, CE: AUTHOR

Abstract

The mask process chamber shown in cross-section in the figure includes a smooth-surfaced dome and an internal baffle system that are effective in reducing causes of process defects. The clear polymer dome is easy to clean and has no crevices that can retain contamination. A concentric internal baffle directs excess liquid away from the spinning mask chuck toward the exhaust/drain system at the bottom of the chamber. Because the diameter of the chamber is two or three times the diameter of the chuck, the likelihood of liquids or other contaminants bouncing back onto the spinning mask or substrate is very small.

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Mask Process Chamber Used to Develop and/or Wet Etch Masks

      The mask process chamber shown in cross-section in the figure
includes a smooth-surfaced dome and an internal baffle system that
are effective in reducing causes of process defects.  The clear
polymer dome is easy to clean and has no crevices that can retain
contamination.  A concentric internal baffle directs excess liquid
away from the spinning mask chuck toward the exhaust/drain system at
the bottom of the chamber.  Because the diameter of the chamber is
two or three times the diameter of the chuck, the likelihood of
liquids or other contaminants bouncing back onto the spinning mask or
substrate is very small.

The numbered physical elements in the figure have the following
functions.

1.  Clear Polymer Dome: Confines liquids that are thrown by
    centrifugal force from the mask and chuck.  The clear smooth
    surface makes it easy to watch internal processing and minimizes
    contaminant buildup.
2.  Hinge: Permits opening the top of the chamber for easy access for
    loading and cleaning.
3.  Chuck: Holds the mask/substrate as it spins.
4.  Chuck Support Pedestal: Houses the rotating shaft that spins the
    chuck.
5.  Cylindrical Chamber Wall: Chamber diameter is two or three times
    the diameter of the chuck to facilitate isolation of excess
    liquids from the chuck area by means of the concentric internal
    baffle.
6.  Concentric Internal Baffle: Located be...