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Reducing Defects in Sputtered Carbon Films

IP.com Disclosure Number: IPCOM000106190D
Original Publication Date: 1993-Oct-01
Included in the Prior Art Database: 2005-Mar-20
Document File: 2 page(s) / 57K

Publishing Venue

IBM

Related People

Hoehn, R: AUTHOR [+3]

Abstract

Defects in carbon films lead to problems (high reject rates during glide height testing, corrosion, and tribological losses (wear, etc.)) with magnetic disks and heads. To eliminate such problems, the films should be free from defects.

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Reducing Defects in Sputtered Carbon Films

      Defects in carbon films lead to problems (high reject rates
during glide height testing, corrosion, and tribological losses
(wear, etc.)) with magnetic disks and heads.  To eliminate such
problems, the films should be free from defects.

      For magnetron carbon sputtering, a graphite target and a gas of
an argon/hydrogen mixture are normally used.  Films thus produced
have a large number of defects or particles (on an average 151 with a
size > 15 "m for an area of 4 cmsup2 and a sputter time of 800 min.).
In connectionwith magnetic disks, these defects are reduced, for
example, by a wash step after sputtering.  This wash step, although
improving the glide height test results, damages the functions of the
carbon film by holes resulting from particles torn out during the
wash step.  Therefore, it is highly desirable to eliminate the wash
step which cannot be inte grated in a vacuum system.

      By means of an Ne/Hsup2 sputter gas mixture and a graphite
target, the number of particles could be reduced by 38.4% compared
with Ar/Hsup2 and graphite.  All comparisons were based on asputter
time of 800 min.

      During sputter tests conducted in Ar/Hsup2 with glass carbon as
a target, the number of defects could be reduced by 70.8% compared
with the commercially used graphite target.  Novel is the combination
of carbon and a neon/hydrogen sputter gas mixture.  This combination,
which was expected to yiel...