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Chemically Hardened Photoresist for Isolation Material in Inductive Heads

IP.com Disclosure Number: IPCOM000106349D
Original Publication Date: 1993-Oct-01
Included in the Prior Art Database: 2005-Mar-21
Document File: 2 page(s) / 38K

Publishing Venue

IBM

Related People

Baratte, H: AUTHOR [+5]

Abstract

This article describes the replacement of the hard baking of the photoresist with a chemical treatment during formation of inductive heads.

This text was extracted from an ASCII text file.
This is the abbreviated version, containing approximately 88% of the total text.

Chemically Hardened Photoresist for Isolation Material in Inductive Heads

      This article describes the replacement of the hard baking of
the photoresist with a chemical treatment during formation of
inductive heads.

      The isolation layer between the two pole tips of magnetic
recording heads consists of successive hard bake photoresist layers
(as shown in the Figure) of which thermal properties and surface
stability are highly irreproducible.

      Therefore the hard baking of the resist is peplaced by a
chemical treatment, e.g., silation [*].

      A typical process for the manufacture of a resist coil
isolation layer "I1" to "I5" is as follows:

      First the photoresist (AZ 1375 R) is spun on, soft baked at
90degreeC and exposed.  Subsequently the hard bake process, which
takes place normally at 240degreeC during 12 to 20 hours, is replaced
by a silation process [*].

      The surface of the so chemically processed resist is stable (no
risk of hydrocarbide desintegration).

      While the reproducibility of the mechanical properties of the
isolation layer is high and the layer shows insensivity to humidity
in the process clean room, the process continues to rely on the exact
same photolitographical method to define the geometry of the P2
slope, as is the case of the standard hard bake process.

      Moreover, the proposed process is simple as well as fast.

Reference

[*]  Jane M. Shaw et al.; "A simplified silylation proces...