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Method for the Preparation of Laminated Magnetic Thin Films

IP.com Disclosure Number: IPCOM000108041D
Original Publication Date: 1992-Apr-01
Included in the Prior Art Database: 2005-Mar-22
Document File: 2 page(s) / 76K

Publishing Venue

IBM

Related People

Wall, AC: AUTHOR

Abstract

Sputtered magnetic thin films have been shown by many authors to exhibit improved magnetic recording properties when the magnetically active layer is deposited in a multilayer structure with alternating non-magnetic "interlayers." Co-based ternary alloys are commonly deposited with Cr as both an underlayer or seed layer and as the interlayer material.

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Method for the Preparation of Laminated Magnetic Thin Films

       Sputtered magnetic thin films have been shown by many
authors to exhibit improved magnetic recording properties when the
magnetically active layer is deposited in a multilayer structure with
alternating non-magnetic "interlayers."  Co-based ternary alloys are
commonly deposited with Cr as both an underlayer or seed layer and as
the interlayer material.

      While the use of Cr as the interlayer is convenient in that it
is readily available in disk manufacturing systems (due to its
popularity as an underlayer), it is impossible in some manufacturing
tools to return the substrates to the Cr deposition position after
the magnetic alloy has been applied.

      It has also been found that the processing procedure of a
magnetic thin film dramatically alters its magnetic properties.  The
processing parameters include deposition pressure, deposition rate,
temperature, residual gas impurities, and bias.  These influence the
crystallographic orientation, polycrystalline grain size, and
intergranular character of the films.

      The interlayer of a multilayer or laminated magnetic structure
then could be made up from the same alloy as the magnetically active
layer with a modulation in the processing parameters providing the
difference in magnetic character.  There are several variations of
this concept which could result in the preferred characteristics of
the interlayer.  It may be formed by one or more of the following
parameters being modulated during the deposition of the ternary Co-
based alloy:
1.   Pressure:  Higher pressure tends to reduce the remanence and the
coercivity.
2.  ...