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Laser Assisted Seeding of Teflon Fluorinated Carbon Composite

IP.com Disclosure Number: IPCOM000108386D
Original Publication Date: 1992-May-01
Included in the Prior Art Database: 2005-Mar-22
Document File: 1 page(s) / 47K

Publishing Venue

IBM

Related People

Afzali-Ardakani, A: AUTHOR [+4]

Abstract

Disclosed are two approaches to laser-assisted palladium seeding of Teflon* fluorinated carbon composite.

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This is the abbreviated version, containing approximately 73% of the total text.

Laser Assisted Seeding of Teflon Fluorinated Carbon Composite

       Disclosed are two approaches to laser-assisted palladium
seeding of Teflon* fluorinated carbon composite.

      Teflon-glass composite is a substrate which has attracted a lot
of attention for use in high density, multilayer packaging. In
addition to inherent shortcomings associated with the composite
itself (e.g., porosity, difficulty in laser ablation and lack of
adhesion to metals), the process of circuitization requires several
steps, starting with surface activation of Teflon, followed by
blanket seeding, photoresist lamination, exposure and metallization
and finally lift-off of the photoresist and etching of the remaining
seed layers. Teflon-fluorinated carbon composite, on the other hand,
has shown significant improvement over Teflon-glass substrate. In
addition, the latter, as it is described below, can easily be
activated by low power UV laser for seeding with palladium and
metallization.

      Teflon-fluorinated carbon composite with 48% Accufluor 1030**
was used in seeding experiments. In the first method the composite is
irradiated with UV laser at 100-150 mJ/cm2 surface analysis by ESCA
shows that at these fluences the composite surface becomes mostly
graphitic in nature. After exposure, the sample is immersed in
palladium chloride solution for few minutes whereby palladium is
deposited in the exposed area. After rinsing with water, the sample
is then placed in electroless coppe...