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A Moveable Multi-Level Metal Mask for Depositing High Temperature Superconducting Oxide Films and Barrier Layers

IP.com Disclosure Number: IPCOM000108431D
Original Publication Date: 1992-May-01
Included in the Prior Art Database: 2005-Mar-22
Document File: 1 page(s) / 71K

Publishing Venue

IBM

Related People

Bumble, B: AUTHOR [+4]

Abstract

Disclosed is an in-vacuum moveable single-metal mask technique for deposition of multi-layers of superconducting oxide films and a high speed electroetching method to fabricate the metal mask. The described technique is particularly suitable for making in-situ tunnel junctions type devices on high-temperature superconducting oxide films for ground planes, insulating barriers top electrodes and metal contact layers.

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A Moveable Multi-Level Metal Mask for Depositing High Temperature Superconducting Oxide Films and Barrier Layers

      Disclosed is an in-vacuum moveable single-metal mask technique
for deposition of multi-layers of superconducting oxide films and a
high speed electroetching method to fabricate the metal mask.  The
described technique is particularly suitable for making in-situ
tunnel junctions type devices on high-temperature superconducting
oxide films for ground planes, insulating barriers top electrodes and
metal contact layers.

      Conventional techniques rely on ex-situ post processing and
photolithography procedures for device fabrication. This in-situ
multi-level metal mask technique, properly designed, can be quite
useful for multi-layer material levels for devices all fabricated
within the same vacuum chamber.

      The metal mask is fabricated by high-speed electrochemical
machining using neutral salt solutions.  The mask material is 0.002"
thick stainless steel patterned with AZ4620 photoresist.  Impingement
of the electrolyte through an array of jets leads to high-speed metal
removal and anisotropy.  Fine dimensions (Z50mm or smaller) with
straight walls can thus be etched.  The dissolved metal ions form
hydroxide precipitates in the electrolyte which can be easily
filtered.  Compared to other wet chemical and dry etching methods,
electrochemical machining has the advantage of being a cost-effective
and high-speed process. Furthermore, the...