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Lamination of High TC Superconducting Films

IP.com Disclosure Number: IPCOM000108865D
Original Publication Date: 1992-Jun-01
Included in the Prior Art Database: 2005-Mar-23
Document File: 1 page(s) / 69K

Publishing Venue

IBM

Related People

Brady, MJ: AUTHOR [+2]

Abstract

High Temperature Superconductors (HTSC's) have potential applications in computers, communications, and radar, in the form of resonators, delay lines, and high speed interconnects. Key to these microwave and digital electronic applications is the requirement that the substrate which contains the HTSC film have a low dielectric constant, which relates to high speeds, and low loss transmission lines, for example. Synthesizing high quality HTSC films generally requires high temperatures (600 to 800~C) either during deposition or in post annealing. In addition, lattice matching of substrates to HTSC films is an important requirement for epitaxial growth. Substrates that meet these requirements, such as MgAl4O4, SrTiO3, BaTiO3, ZrO3, and LaAlO3, are all good growth-substrates but have high dielectric constants, and/or high R.F.

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Lamination of High TC Superconducting Films

      High Temperature Superconductors (HTSC's) have potential
applications in computers, communications, and radar, in the form of
resonators, delay lines, and high speed interconnects.  Key to these
microwave and digital electronic applications is the requirement that
the substrate which contains the HTSC film have a low dielectric
constant, which relates to high speeds, and low loss transmission
lines, for example.  Synthesizing high quality HTSC films generally
requires high temperatures (600 to 800~C) either during deposition or
in post annealing.  In addition, lattice matching of substrates to
HTSC films is an important requirement for epitaxial growth.
Substrates that meet these requirements, such as MgAl4O4, SrTiO3,
BaTiO3, ZrO3, and LaAlO3, are all good growth-substrates but have
high dielectric constants, and/or high R.F. losses. Microwave
substrates such as Quartz, Silicon, Sapphire and Glass have low
dielectrics but do not allow for good quality films to be deposited.

      Disclosed is a method that allows the growth of superconducting
films on an acceptable growth-substrate and then transfers the film
to an acceptable microwave substrate by a lamination process.  The
technique utilizes a soluble substrate which has a high melting point
(>>650~C), a Coefficient of Thermal Expansion (CTE) and lattice
spacing that matches the superconducting film.

      The method consists of selection of a growth subs...