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Browse Prior Art Database

Submicron Electron Beam Pattern Transfer

IP.com Disclosure Number: IPCOM000109080D
Original Publication Date: 1992-Jul-01
Included in the Prior Art Database: 2005-Mar-23
Document File: 1 page(s) / 52K

Publishing Venue

IBM

Related People

Cuomo, JJ: AUTHOR [+4]

Abstract

Disclosed is a method of electron beam projection printing using a thin diamond membrane mask. A collimated electron beam is used to illuminate a sample through a mask. The polycrystalline diamond membrane mask contains a pattern which is to be transferred to the sample coated with an electron-sensitive resist. The sample is usually located close, less than 1.mm from the mask, resulting is a pattern transfer without scaling.

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Submicron Electron Beam Pattern Transfer

       Disclosed is a method of electron beam projection
printing using a thin diamond membrane mask.  A collimated electron
beam is used to illuminate a sample through a mask.  The
polycrystalline diamond membrane mask contains a pattern which is to
be transferred to the sample coated with an electron-sensitive
resist.  The sample is usually located close, less than 1.mm from the
mask, resulting is a pattern transfer without scaling.

      The mask is made by depositing a 1-5 mm thick polycrystalline
diamond film onto a Si substrate using a plasma enhanced CVD process
(1).  The central region of the Si substrate is then etched leaving a
Si rim holding the diamond membrane.  A patterned absorber made of a
metal, such as W, Au, or Au-Pt alloy or the like, is deposited onto
the diamond.  The diamond is deposited with sufficient tensile stress
(2) such that it will remain flat when used for printing with the
absorber pattern on it.

      Diamond is ideally suited as a mask material for projection
electron beam lithography.  In addition to being a hard, stiff,
radiation-resistant material, it has a high thermal conductivity (3)
and can be pretensioned (2).  These latter 2 properties make it
unique for this application.  During an exposure the 30-100 keV
electron beam, which is either a uniform flood beam or a small area
beam, a few mm2, scanned over the mask, imparts a significant amount
of energy into the mask. ...