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Localized Etching Selectivity Enhancement in Polymer Films by High Energy Ion Beam Treatment

IP.com Disclosure Number: IPCOM000109147D
Original Publication Date: 1992-Jul-01
Included in the Prior Art Database: 2005-Mar-23
Document File: 1 page(s) / 50K

Publishing Venue

IBM

Related People

Babich, E: AUTHOR [+5]

Abstract

In plasma etching of polymer films the selectivity is achieved by using a barrier layer in combination with photolithographic techniques. This involves complicated deposition, photolithography and alternate plasma etching steps and sometimes results in surface residue problems.

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Localized Etching Selectivity Enhancement in Polymer Films by High Energy Ion Beam Treatment

      In plasma etching of polymer films the selectivity is achieved
by using a barrier layer in combination with photolithographic
techniques.  This involves complicated deposition, photolithography
and alternate plasma etching steps and sometimes results in surface
residue problems.

      Disclosed here is a high energy ion beam treatment technique
whereby etching selectivity for pattern delineation can be imparted
in polymer and particularly polyimide films by exposing the
liquid-nitrogen cooled target films to high energy ion beams of
appropriate species and energy (chosen for chemical reactivity and
penetration depth) either by blanket bombardment through a contact
mask (or photoresist layer) or by focused beam writing.  A
selectivity of 5 to 10 can be easily obtained.  The advantages of the
proposed technique are threefold: (1) It eliminates the barrier layer
and associated deposition and alternate etching steps, (2) There will
be no undercut during etching and isotropic etch profile can be
obtained, and (3) There will be no surface residue due to barrier
layer.

      Ions of 12C, 16O, and 19F having 1.0 MeV of energy were used to
irradiate polyimide (BPDA-PDA) films with a total dose of 9 x 1015
ions/cm2.  During irradiation the film substrate was cooled by liquid
nitrogen to prevent film heating and accompanying annealing effects.
ESCA measurements indicate...