Browse Prior Art Database

Novel Process to Texture Thin Film Disk Surface

IP.com Disclosure Number: IPCOM000109249D
Original Publication Date: 1992-Aug-01
Included in the Prior Art Database: 2005-Mar-23
Document File: 1 page(s) / 43K

Publishing Venue

IBM

Related People

Hwang, C: AUTHOR [+2]

Abstract

Carbon overcoat of a few hundred angstroms has been widely used to protect the magnetic recording disks from corrosion, friction and wear. However, highly smooth surface of the overcoat often causes stiction between the recording head and the disk, especially after a long rest period. To reduce the interface stiction, proper texturing of the disk surface is required. The most popular technique to texture the disk surface is via a mechanical polishing of NiP undercoat using either fixed or free abrasive methods. Other methods of producing surface roughness to reduce (1,2,3) head/disk contact area have also been reported in the literature (Ref.) In addition, we have developed another method to successfully texture the carbon surface by a vacuum deposition/etch process.

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Novel Process to Texture Thin Film Disk Surface

       Carbon overcoat of a few hundred angstroms has been
widely used to protect the magnetic recording disks from corrosion,
friction and wear.  However, highly smooth surface of the overcoat
often causes stiction between the recording head and the disk,
especially after a long rest period.  To reduce the interface
stiction, proper texturing of the disk surface is required.  The most
popular technique to texture the disk surface is via a mechanical
polishing of NiP undercoat using either fixed or free abrasive
methods.  Other methods of producing surface roughness to reduce
(1,2,3) head/disk contact area have also been reported in the
literature (Ref.)  In addition, we have developed another method to
successfully texture the carbon surface by a vacuum deposition/etch
process.  This is accomplished by sputter depositing a discontinuous
film, such as gold islands, on top of the carbon surface and
subsequently removing the exposed carbon overcoat (areas not covered
by gold islands) via a reactive etching process using oxygen plasma
as the etchant.  Using this technique to texture the carbon overcoat
on thin film disk surface, we have demonstrated much lower rest
stiction values compared to that of otherwise identical disks.

      References
(1)  U.S. Patent 4,539,265.
(2)  U.S. Patent 5,030,494.
(3)  R. Ranjan, D. L. Lambeth, M. Tromel, P. Goglia and Y. Li, "Laser
texturing for low flying height media," J ....