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Method for Burnishing Substrates Before Applying the Magnetic Film

IP.com Disclosure Number: IPCOM000109945D
Original Publication Date: 1992-Sep-01
Included in the Prior Art Database: 2005-Mar-25
Document File: 1 page(s) / 33K

Publishing Venue

IBM

Related People

Keller, CG: AUTHOR

Abstract

A polished disk substrate is sputtered with carbon. This is then burnished to produce an asperity-free surface.

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Method for Burnishing Substrates Before Applying the Magnetic Film

      A polished disk substrate is sputtered with carbon.  This is
then burnished to produce an asperity-free surface.

      Polished glass and electroless nickel-phosphorus disk
substrates were sputtered to form a thin layer of carbon on both
sides.  This yields a burnishable surface.  A special burnishing
slider was run over these surfaces to remove any asperities that were
left by the polishing process.  If a polishing process results in
peak heights of N angstroms, then 2N angstroms of carbon can be
sputtered on the surface and N angstroms can be machined off by the
burnish head.  The burnish head cannot be applied to a metallic
surface without galling, or a glass surface without causing
micro-fracturing.  But a carbon surface can be machined in a very
controlled manner.  The burnishing edge of the head is rigid and
defines a plane as the disk rotates under it.  This reduces the
amplitude of the small scale waviness left in the surface from the
nonrigid, compliant polishing process.  After burnishing, the disks
were sputtered with the magnetic layer and carbon overcoat by the
normal procedure.

      Disclosed anonymously.