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Compact Microwave Plasma Source

IP.com Disclosure Number: IPCOM000110065D
Original Publication Date: 1992-Oct-01
Included in the Prior Art Database: 2005-Mar-25
Document File: 2 page(s) / 70K

Publishing Venue

IBM

Related People

Cuomo, JJ: AUTHOR [+4]

Abstract

The instrument described here is a compact, microwave-driven plasma source. The source produces a beam or environment of charged particles which then may be used in material deposition applications, etching and/or surface modification. The plasma source may be operated for long periods of time (many hours) with either inert or reactive gases. This source can be used with grids to produce a directed beam of ions and can also function without grids allowing the plasma to diffuse out of the source in a random manner. In addition, this source can be used with an external axial magnetic field to produce a low energy ambipolar ion beam.

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Compact Microwave Plasma Source

       The instrument described here is a compact,
microwave-driven plasma source.  The source produces a beam or
environment of charged particles which then may be used in material
deposition applications, etching and/or surface modification.  The
plasma source may be operated for long periods of time (many hours)
with either inert or reactive gases.  This source can be used with
grids to produce a directed beam of ions and can also function
without grids allowing the plasma to diffuse out of the source in a
random manner.  In addition, this source can be used with an external
axial magnetic field to produce a low energy ambipolar ion beam.

      This plasma source consists of four main components that are
depicted in the figure.  A dielectric-filled RF/microwave coaxial
feed 1 carries power into a water-cooled discharge chamber 2.  A gas
distribution channel 3 located at the rear of the discharge chamber
emits the desired gas composition into the discharge chamber.  A
multi-cusp, static magnetic field B is produced inside the discharge
chamber by an arrangement of permanent magnets 4.  The high electric
fields of the TEM (transverse electromagnetic) mode on the coaxial
line in conjunction with the static magnetic field produces regions
of high electron cyclotron resonant heating (ECR) within the
discharge.  Such electron heating sustains the discharge at low input
powers (50-100 watts) and low pressues (<1m Torr) and prod...