Browse Prior Art Database

TFT/LCD Cell Structure

IP.com Disclosure Number: IPCOM000110526D
Original Publication Date: 1992-Dec-01
Included in the Prior Art Database: 2005-Mar-25
Document File: 2 page(s) / 36K

Publishing Venue

IBM

Related People

Suzuki, H: AUTHOR

Abstract

Disclosed is a structure of TFT/LCD cell's multi-transfer electrodes and cell sealing configuration. This technique is widely applicable to large-size TFT/LCD.

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TFT/LCD Cell Structure

       Disclosed is a structure of TFT/LCD cell's multi-transfer
electrodes and cell sealing configuration.  This technique is widely
applicable to large-size TFT/LCD.

      Multi-transfer structure is inevitable to achieve large high
resolution display due to speed limitation of high-voltage driver IC.

      To achieve multi-transfer cell structure with controlled cell
gap at display periphery, stress imbalance over sealing, shown in
Fig. 1, shall be eliminated.
Type 1: As shown in Fig. 2, transfers are located in line with
sealing and that portion of the seal is curved not to contact each
other. This structure is simple to apply, but compensation of stress
from the curved seal portion remains even though its magnitude is
small.
Type 2: As shown in Fig. 3, stress from transfers and curved portion
of seal are both considered to be balanced. This eliminates any cell
gap distortion due to repulsive force imbalance from transfer.

      With this method, high performance TFT/LCD can be realized.