Browse Prior Art Database

Method for Making a Surface Contamination Standard

IP.com Disclosure Number: IPCOM000110861D
Original Publication Date: 1994-Jan-01
Included in the Prior Art Database: 2005-Mar-26
Document File: 2 page(s) / 37K

Publishing Venue

IBM

Related People

Blaise, RE: AUTHOR [+4]

Abstract

By using a precision focus ion-beam deposition system, simulated particles or bumps of controlled dimensions in the micron-size range are created at predetermined positions on an otherwise featureless substrate. This provides particles of known dimensions which are adherent to and in known positions on a substrate surface. Sensitivity and repeatibility of surface particle detection instruments may be checked using this standard. Unlike previous standards, this one may be cleaned and reused, and provides unequivocal knowledge that calibration particles are detectable or not since their location is well-defined.

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Method for Making a Surface Contamination Standard

      By using a precision focus ion-beam deposition system,
simulated particles or bumps of controlled dimensions in the
micron-size range are created at predetermined positions on an
otherwise featureless substrate.  This provides particles of known
dimensions which are adherent to and in known positions on a
substrate surface.  Sensitivity and repeatibility of surface particle
detection instruments may be checked using this standard.  Unlike
previous standards, this one may be cleaned and reused, and provides
unequivocal knowledge that calibration particles are detectable or
not since their location is well-defined.

      Precision focus ion-beam processes and systems are commercially
available for use in such applications as repair of chromium
photomasks used in fabricating integrated circuits.  A variety of
hard, reflective materials having excellent adhesion to glass or
silicon are routinely deposited in precise locations and having
precision dimensions.  This type of equipment and process is used in
this application to form calibration particles on a suitable
substrate at precise locations.  A simple line or cross-pattern
comprised of a series of uniformly spaced calibration particles
formed on an otherwise featureless substrate provides easy
differentiation between calibration particles and random defects or
particulate contamination of unknown size.

      Any of several particle detection instru...