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Heater Stage for Double-Sided Large Area High Tc Film Growth

IP.com Disclosure Number: IPCOM000111689D
Original Publication Date: 1994-Mar-01
Included in the Prior Art Database: 2005-Mar-26
Document File: 2 page(s) / 51K

Publishing Venue

IBM

Related People

Kleinsasser, AW: AUTHOR [+3]

Abstract

Disclosed is a heater stage which allows substrates to be heated to temperatures approaching 1000 C in high partial pressures of reactive gases, such as oxygen, without the use of adhesive backing, such as silver paste. This method is applicable to the growth of high Tc superconducting films on large-area substrates and allows even two-sided depositions.

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Heater Stage for Double-Sided Large Area High Tc Film Growth

      Disclosed is a heater stage which allows substrates to be
heated to temperatures approaching 1000 C in high partial pressures
of reactive gases, such as oxygen, without the use of adhesive
backing, such as silver paste.  This method is applicable to the
growth of high Tc superconducting films on large-area substrates and
allows even two-sided depositions.

      High Tc film growth requires high substrate temperatures (up to
900º  C) and oxygen ambients.  The substrate heater is a
critical component of any processing system.  The substrate must be
thermally anchored to the heater by a material, such as silver paste.
The use of such a bonding agent is impractical for large-area or
two-sided deposition.  This invention uses gas to provide thermal
contact between an insulating substrate and a heater.  The structure
of the heater stage is shown in the Figure.  Initially, the wafer is
approximately flat.  By introducing gas into the heater stage on the
backside of the wafer, the wafer assumes a roughly parabolic shape.
The plate is shaped so that the distance between the back of the
wafer and the heater block surface is minimized and approximately
constant.  The wafer is clamped to the block to provide a low-leakage
seal.  The gas applied to the heater block is the same as that used
in the process so that this seal need not be vacuum-tight;
contamination is not an issue.

      The performa...