Browse Prior Art Database

Dry Development Processing of Resists Via Surface Incorporation of Iron-Containing Complexes

IP.com Disclosure Number: IPCOM000112136D
Original Publication Date: 1994-Apr-01
Included in the Prior Art Database: 2005-Mar-26
Document File: 2 page(s) / 20K

Publishing Venue

IBM

Related People

Babich, E: AUTHOR [+4]

Abstract

Positive and negative tone dry developable photoresist systems have been found when upon exposure, baking and dipping into Fe-containing solutions followed by oxygen plasma processing corresponding images have been developed due to selective incorporation of iron-containing groups into unexposed or exposed areas.

This text was extracted from an ASCII text file.
This is the abbreviated version, containing approximately 100% of the total text.

Dry Development Processing of Resists Via Surface Incorporation of
Iron-Containing Complexes

      Positive and negative tone dry developable photoresist systems
have been found when upon exposure, baking and dipping into
Fe-containing solutions followed by oxygen plasma processing
corresponding images have been developed due to selective
incorporation of iron-containing groups into unexposed or exposed
areas.

      For example, when negative tone AZ 5200 photoresist was treated
in 1% ferrocenecarboxaldexyde/water solution positive tone images
were developed after O&sub2.  RIE.  When a solution of
1,1'-ferrocenedicarboxylic acid in xylenes was used, negative tone
images were developed after oxygen RIE.