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Titanium Oxide for Low-Absorbing High-Reflectivity Laser Mirror Coatings

IP.com Disclosure Number: IPCOM000112340D
Original Publication Date: 1994-Apr-01
Included in the Prior Art Database: 2005-Mar-27
Document File: 2 page(s) / 29K

Publishing Venue

IBM

Related People

Dietrich, HP: AUTHOR [+7]

Abstract

A mirror coating for 980 nm semiconductor laser diodes is proposed. This mirror coating comprises layers of titanium oxide (TiOx) being a high-index material with negligible absorption.

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Titanium Oxide for Low-Absorbing High-Reflectivity Laser Mirror Coatings

      A mirror coating for 980 nm semiconductor laser diodes is
proposed.  This mirror coating comprises layers of titanium oxide
(TiOx) being a high-index material with negligible absorption.

      For back mirrors, which usually have a reflectivity higher than
0.9, three pairs of coating layers are needed because titanium oxide
has a refractive index of only n=2.45.  In the Figure a schematic
cross-sectional view of a laser diode 1 with the proposed mirror
coating is shown.  This mirror coating consists of an 'Al' sub 2 O
sub 3 passivation layer, a stack of three TiO sub 2 layers and two
SiO sub 2 layers.