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Circuit Rework Method on Pattern Plating

IP.com Disclosure Number: IPCOM000112724D
Original Publication Date: 1994-Jun-01
Included in the Prior Art Database: 2005-Mar-27
Document File: 2 page(s) / 24K

Publishing Venue

IBM

Related People

Shirai, M: AUTHOR [+2]

Abstract

This article describes a rework method on a pattern-plated circuit. Contamination may cause open circuits during plating. Such open circuits are repaired by re-plating after removal of the contamination.

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Circuit Rework Method on Pattern Plating

      This article describes a rework method on a pattern-plated
circuit.  Contamination may cause open circuits during plating.  Such
open circuits are repaired by re-plating after removal of the
contamination.

      The Figures show cross sectional views of a defectively plated
portion with contaminants and their removal.  After removing these
contaminants by laser or mechanical treatment, the portion is covered
with additional plating resist to just expose the regions to be
re-plated with the initial plating mask being left.  After plating,
the surface is ground to planarize the upper surface.