Browse Prior Art Database

Particle Free Ionizer

IP.com Disclosure Number: IPCOM000112912D
Original Publication Date: 1994-Jun-01
Included in the Prior Art Database: 2005-Mar-27
Document File: 2 page(s) / 33K

Publishing Venue

IBM

Related People

Kitagawa, S: AUTHOR

Abstract

Disclosed is a particle free ionizer in which fan 2 and filter 6 are used to provide particle free air flow which contains ions only.

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Particle Free Ionizer

      Disclosed is a particle free ionizer in which fan 2 and filter
6 are used to provide particle free air flow which contains ions
only.

      Ionizers are used in semiconductor manufacturing clean rooms to
prevent electrostatic deposition of dusts or contaminants onto wafer
or mask surfaces.  Typical ionizers currently used in the industry
have the problem of emitting particles or contaminants from the top
of an emitter to thereby result in contamination.  So, such ionizers
should not be used in clean room areas.

This new design provides particle free air while maintaining the
ionizer efficiency.

      The Figure shows the configuration of the present ionizer 8.
Air 1 is introduced into pipe 3 through the fan 2.  Fan 2 blows air 1
through the filter 6.  Particles 5 generated from the emitter 4 are
removed by the filter 6.  As a result, air including only plus and
minus ions 7 is generated from the ionizer 8.