Browse Prior Art Database

Exposure Method of Array Photo Process for Thin Film Transistor/Liquid Crystal Display

IP.com Disclosure Number: IPCOM000113048D
Original Publication Date: 1994-Jul-01
Included in the Prior Art Database: 2005-Mar-27
Document File: 2 page(s) / 28K

Publishing Venue

IBM

Related People

Fujii, Y: AUTHOR

Abstract

Disclosed is a technique to achieve Thin Film Transistor/Liquid Crystal Display's (TFT/LCD's) high display image quality by introducing new photo mask patterning method for stepper type photo-lithography to minimize image sticking error.

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Exposure Method of Array Photo Process for Thin Film Transistor/Liquid
Crystal Display

      Disclosed is a technique to achieve Thin Film Transistor/Liquid
Crystal Display's (TFT/LCD's) high display image quality by
introducing new photo mask patterning method for stepper type
photo-lithography to minimize image sticking error.

      Fig. 1 shows shot image of normal exposure process.  Generally
each shot requires a few micron of overlap area.  The wiring in
overlap area become narrower due to double-exposure, consequently
higher resistance at narrowed wiring degrade panel quality.

      Fig. 2 shows photo process with new mask pattern design
technique in case of using positive resist, this technique is to
widen wiring pattern in overlap area.  Wiring pattern after photo
process achieves straight pattern.

      This technique is also applicable for Black Matrix patterning
of COLOR FILTER, and it enables more image quality improvement.