Browse Prior Art Database

Topside Rinse by Force of Gravity

IP.com Disclosure Number: IPCOM000113151D
Original Publication Date: 1994-Jul-01
Included in the Prior Art Database: 2005-Mar-27
Document File: 2 page(s) / 18K

Publishing Venue

IBM

Related People

Schlechter, S: AUTHOR

Abstract

One step in photo-lithography is cleaning the wafer border of photoresist.

This text was extracted from an ASCII text file.
This is the abbreviated version, containing approximately 100% of the total text.

Topside Rinse by Force of Gravity

      One step in photo-lithography is cleaning the wafer border of
photoresist.

      It was done by dispensing compressed solvent on the wafer
surface.  The result were tiny bubbles of solvent, reducing our
yield.

Doing it without pressure is the solution.

All installed equipment can still be used to fill a reservoir placed
on higher level as the jet.

The reservoir is needed as a pressureless buffer.

Only one additional valve is controlling bubble free flow for
dispensing wafers with better yield.