Browse Prior Art Database

Agglomerated Tin Oxide Films for Improved Disk Tribology

IP.com Disclosure Number: IPCOM000115747D
Original Publication Date: 1995-Jun-01
Included in the Prior Art Database: 2005-Mar-30
Document File: 2 page(s) / 62K

Publishing Venue

IBM

Related People

Ahlert, R: AUTHOR [+4]

Abstract

The use of nano-bumps of tin-oxide on the disk media surface provides an optimum solution for both magnetic performance and disk tribology (low friction-durable interface). Thin-film disk structures have used textured (controlled roughness) substrates to minimize the contact area between the head (slider) and the disk surface and thus provide the required low stiction interface. Experiments have shown that the disk texturing process (with an abrasive tape or slurry) can create magnetic defects in the overlying magnetic medium. The increased requirements for ultra-high density recording has lead to the use of very smooth disk substrates with little or no roughness. However, this requirement has lead to concern about the tribology of the interface.

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This is the abbreviated version, containing approximately 52% of the total text.

Agglomerated Tin Oxide Films for Improved Disk Tribology

      The use of nano-bumps of tin-oxide on the disk media surface
provides an optimum solution for both magnetic performance and disk
tribology (low friction-durable interface).  Thin-film disk
structures have used textured (controlled roughness) substrates to
minimize the contact area between the head (slider) and the disk
surface and thus provide the required low stiction interface.
Experiments have shown that the disk texturing process (with an
abrasive tape or slurry) can create magnetic defects in the overlying
magnetic medium.  The increased requirements for ultra-high density
recording has lead to the use of very smooth disk substrates with
little or no roughness.  However, this requirement has lead to
concern about the tribology of the interface.

      The invention describes an approach to use ultra-smooth
substrates and deposit nano-bumps as part of the disk overcoat and
thus provide a low stiction interface.  The novel disk structure was
fabricated using an atomically smooth glass substrate (rms roughness
of 1 nm).  An underlayer of CrV (10-50 nm) was sputter deposited
followed by the CoPtCr magnetic media (10-50 nm) followed by an oxide
layer of yitteria stabilized zirconia (YSZ), silicon dioxide (SiO2),
or tin oxide (SnO2) in the 3-5 nm thickness range.  The oxide buffer
layer provides a growth surface for the nano-bumps and provides a
diffusion barrier between the overcoat and the magnetic media.  A
thin Sn layer (5-10 nm)...