Browse Prior Art Database

Self Aligning Multiple Disk Deposition Platten

IP.com Disclosure Number: IPCOM000116034D
Original Publication Date: 1995-Jul-01
Included in the Prior Art Database: 2005-Mar-30
Document File: 2 page(s) / 56K

Publishing Venue

IBM

Related People

Flachbart, RH: AUTHOR [+3]

Abstract

The design of a substrate platten to hold multiple disks which provides self alignment and positive gripping of the substrate for subsequent sputter deposition in either a stationary or passby deposition system.

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This is the abbreviated version, containing approximately 100% of the total text.

Self Aligning Multiple Disk Deposition Platten

      The design of a substrate platten to hold multiple disks which
provides self alignment and positive gripping of the substrate for
subsequent sputter deposition in either a stationary or passby
deposition system.

      The invention disclosed here is a design of a platten for use
in hard disk sputtering systems.  This multi-disk platten can be used
in stationary and passby sputtering systems.  The platten is
fabricated from hardened spring steel.  The disks are held in the
platten by the spring action of the platten's edges as shown in the
Figure.  The spring constant is chosen to allow for expansion of the
disk during processing at elevated temperatures.  The groove in which
the disk is held can also provide room for expansion as well as a
facility for self alignment of the disk in the platten.  A pair of
holes is provided to allow for opening of the spring edge for disk
loading.  Loading can be achieved manually or with robotics.  The
loaded platten can be placed in process cassettes for subsequent
processing in stationary sputtering systems or loading onto a pallet
for passby sputtering.  An additional advantage is reduced shadowing
during sputter deposition.