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Browse Prior Art Database

X-ray Point Source

IP.com Disclosure Number: IPCOM000116102D
Original Publication Date: 1995-Aug-01
Included in the Prior Art Database: 2005-Mar-30
Document File: 2 page(s) / 52K

Publishing Venue

IBM

Related People

-W Fink, H: AUTHOR

Abstract

An X-ray point source is presented combining a high brightness and a small source size. A schematic design of the instrument is shown in the Figure.

This text was extracted from an ASCII text file.
This is the abbreviated version, containing approximately 63% of the total text.

X-ray Point Source

      An X-ray point source is presented combining a high brightness
and a small source size.  A schematic design of the instrument is
shown in the Figure.

      The X-ray radiation is excited in a thin film, which is made of
a material with an efficient electron-to-x-ray conversion (e.g., Au,
Al)
and which is supported by a frame of material of low x-ray absorption
(carbon, beryllium).  Excitation is provided by an electron point
source
(1,2,3).  The electrons are extracted by a low voltage and focussed
by
one or several microlenses.  The low extraction voltage enables the
use
of higher voltages (5 to 10 kV) for further acceleration of the
electrons.

      The size of the x-ray source depends on the beam diameter of
the electron beam, its energy distribution, and pattern of the
scattered electrons in the plane of the film.  For limiting the
source size further, one may consider to replace the flat film by a
layer of (isolated) precipitates or clusters, which could act as
target for the electron beam.  Small metal clusters, for example,
which grow spontaneously on carbon, could be used.  In this case
mainly the shape of a cluster determines the size of the x-ray
source; the diameter of the electron beam in the plane of the film
could then even exceed slightly the diameter of the cluster.  A
difference is realized by replacing the film and the supporting
structure altogether with a thin rod of the same materials, the tip
of which woul...