Browse Prior Art Database

Add-on Sputtering Chamber to Coat Cathode Ray Tube Faceplates

IP.com Disclosure Number: IPCOM000116136D
Original Publication Date: 1995-Aug-01
Included in the Prior Art Database: 2005-Mar-30
Document File: 2 page(s) / 40K

Publishing Venue

IBM

Related People

Garwin, RL: AUTHOR [+2]

Abstract

It is desirable to coat the faceplate of a Cathode Ray Tube (CRT) monitor with a conductive coating to avoid dust build up, annoying electrostatic discharges, and to meet certain country-specific requirements. Such a coating could also be used as a touch-input sensor. One way to form a durable coating is to sputter-deposit a film such as Indium-Tin Oxide. A conventional process would require a large vacuum system to hold the entire CRT, with a relatively long pump-down. Instead, a relatively small vacuum chamber is proposed. This chamber would be applied to the exterior of the CRT. It would be inexpensive and cycle very quickly, thus reducing both capital and labor costs.

This text was extracted from an ASCII text file.
This is the abbreviated version, containing approximately 98% of the total text.

Add-on Sputtering Chamber to Coat Cathode Ray Tube Faceplates

      It is desirable to coat the faceplate of a Cathode Ray Tube
(CRT) monitor with a conductive coating to avoid dust build up,
annoying electrostatic discharges, and to meet certain
country-specific requirements.  Such a coating could also be used as
a touch-input sensor.  One way to form a durable coating is to
sputter-deposit a film such as Indium-Tin Oxide.  A conventional
process would require a large vacuum system to hold the entire CRT,
with a relatively long pump-down.  Instead, a relatively small vacuum
chamber is proposed.  This chamber would be applied to the exterior
of the CRT.  It would be inexpensive and cycle very quickly, thus
reducing both capital and labor costs.  In addition, it can be used
even after an assembly stage which adds materials to the exterior of
the CRT which are incompatible with the normal sputtering process.

      An example is given in the Figure, which shows a side view of a
CRT 1 and chamber 2 prior to mating.  "O"-ring 3, or an equivalent
gasket provides the seal.  The chamber includes vacuum gauge 4,
sputtering cathode 5 and electrical feed-through 6.  It is pumped out
through a flexible vacuum line 7 after mating.  The chamber can be
raised and lowered via a chain-lift or similar mechanism (not shown).
Alternatively, the chamber can be fixed, either as shown or inverted,
and the CRT raised or lowered into contact.  In either case, the
entire process...