Browse Prior Art Database

Ion Milling for Inductive Magnetic Heads

IP.com Disclosure Number: IPCOM000116144D
Original Publication Date: 1995-Aug-01
Included in the Prior Art Database: 2005-Mar-30
Document File: 2 page(s) / 41K

Publishing Venue

IBM

Related People

Carl, P: AUTHOR [+3]

Abstract

Disclosed is a process for fabricating inductive magnetic heads (OEM) having small and well defined poletips with accurate alignment.

This text was extracted from an ASCII text file.
This is the abbreviated version, containing approximately 79% of the total text.

Ion Milling for Inductive Magnetic Heads

      Disclosed is a process for fabricating inductive magnetic heads
(OEM) having small and well defined poletips with accurate alignment.

      Today, small and well defined poletips for advanced inductive
magnetic heads cannot be produced by the use of conventional
electroplating processes of the poletips.  Furthermore, accurate
alignment with reasonable yields can only be achieved by the use of
steppers instead of photo scanners.

      The process of ion milling has been used for the production of
inductive heads for years.  However, poletip thickness was around 1
micrometer and the topography was around 15 micrometer.  There was no
use of ion milling for fabricating wafers with poletips of, e.g., 4
micrometer and a topography of, e.g., 15 micrometer.

      Ion milling of poletips for inductive magnetic heads has shown
to be a solution for both problems, accurate alignment of the
poletips to each other as well as well defined shape and definition
of the poletips.

The following problems have been solved by the proposed ion milling
process:
  o  Photoresist coverage of pole 2 during extensive ion milling of
      poletips thicker than, e.g., 4 micrometer each and more than 20
      micrometer of wafer topography,
  o  Control of pole 1-width and pole 2-width, delta-polewidth
  o  Resist strip after ion milling without collapsing poletips

      The suggested ion milling process has the adva...