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Browse Prior Art Database

Magnetron Sputter Target with Optimized Roof Piece Design

IP.com Disclosure Number: IPCOM000116567D
Original Publication Date: 1995-Oct-01
Included in the Prior Art Database: 2005-Mar-30
Document File: 2 page(s) / 55K

Publishing Venue

IBM

Related People

Meyer, D: AUTHOR [+3]

Abstract

Disclosed is an optimized magnetron sputter target which shows highly uniform target erosion due to its optimized roof piece design. The disclosed type of target geometry provides enhanced target utilization and cost reduction.

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Magnetron Sputter Target with Optimized Roof Piece Design

      Disclosed is an optimized magnetron sputter target which shows
highly uniform target erosion due to its optimized roof piece design.
The disclosed type of target geometry provides enhanced target
utilization and cost reduction.

      In magnetron sputtering suitable magnetic fields allow to
concentrate the glow discharge near the target surface.  In the cases
where ferromagnetic target materials are used the target 1 is partly
covered by roof pieces 2 as shown in Fig. 1.  This leads to
non-uniformities in the magnetic field along the target 1, to
non-uniform target erosion and thus low material utilization.
Frequent target changes limit the productivity.

      The problem is solved by modifying the roof piece geometry and
modelling the magnetic fields near the target using the finite
element method (FEM).  With the help of FEM the sloped roof piece 2
geometry of Fig. 2 has been found which provides substantially
uniform magnetic field lines along the central target piece 1.  Fig.
3 shows that with this target design the maxima of the magnetic field
lines are drastically reduced and accordingly the target utilization
is enhanced.