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Black Matrix Patterning with Half-Tone Mask

IP.com Disclosure Number: IPCOM000116784D
Original Publication Date: 1995-Nov-01
Included in the Prior Art Database: 2005-Mar-31
Document File: 2 page(s) / 38K

Publishing Venue

IBM

Related People

Kan, Y: AUTHOR [+2]

Abstract

Disclosed is a BLACK MATRIX patterning method with using half tone mask. BLACK MATRIX is constructed on Color Filter glass. This program is to reduce the cycle of UV-Exposing on a glass with using half tone glass mask which can eliminate 2nd step UV exposing on a glass.

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Black Matrix Patterning with Half-Tone Mask

      Disclosed is a BLACK MATRIX patterning method with using half
tone mask.  BLACK MATRIX is constructed on Color Filter glass.  This
program is to reduce the cycle of UV-Exposing on a glass with using
half tone glass mask which can eliminate 2nd step UV exposing on a
glass.

      The Figure shows the description of the disclosure.  Usually,
the Posi-resist on glass outer side edge is thicker than that of
glass inner side and those glass outer side resist should be removed
with sufficient UV-exposing (energy).  The UV energy needed for glass
outer side resist removal is higher than that for glass inner side.
Then current process consists of 1st inner and outer side UV exposing
and 2nd one for only outer side resist removal (See Figure -
"Current").

      This device can provide two level UV-exposing on a glass
simultaneously with utilizing half tone mask leading one cycle
UV-exposing at Black-Matrix process (See Figure - "Disclosed").