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Application of Texture to Thin-Film Magnetic Recording Disks by Patterned Deposition

IP.com Disclosure Number: IPCOM000117018D
Original Publication Date: 1995-Dec-01
Included in the Prior Art Database: 2005-Mar-31
Document File: 2 page(s) / 42K

Publishing Venue

IBM

Related People

Crowder, MS: AUTHOR [+2]

Abstract

The mechanical performance of a head disk interface is critically dependent upon the presence of texture on the disk. Since deposition of the magnetic film on a textured substrate adversely effects the Soft Error Rate at high linear densities, it would be desirable to apply texture after the deposition of the magnetic film.

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This is the abbreviated version, containing approximately 78% of the total text.

Application of Texture to Thin-Film Magnetic Recording Disks by Patterned
Deposition

      The mechanical performance of a head disk interface is
critically dependent upon the presence of texture on the disk.  Since
deposition of the magnetic film on a textured substrate adversely
effects the Soft Error Rate at high linear densities, it would be
desirable to apply texture after the deposition of the magnetic film.

      A thin solid polymeric film is demonstrated which can be
patterned during deposition to provide a means for texturing the
overcoat of thin-film magnetic recording disks.  In this process, an
Ion-Beam/Plasma source is used to apply texture following sputtering
of the magnetic film, via polymerization of a gas-phase precursor.
The substrate is placed into a high vacuum chamber at normal
incidence to either an ion beam or a plasma source.  With both the
ion beam, and the ECR plasma, Argon is typically used to establish a
discharge.  A fluorocarbon/hydrocarbon is then allowed to flow across
the surface of the disk inducing deposition.  To obtain sufficient
deposition rates, the precursor is preferably one containing an
easily polymerizable moeity, e.g., unsaturated alkyl, diene, styrene,
acrylate, etc..  The polymer is textured by depositing through a mask
with the desired pattern (one could also image the grids of the ion
beam source to produce the patterned deposition).  In this work, a
mask was made from fine stainless steel mesh (50 micron wi...