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NLO Chromophore Generation for Active Waveguide Applications

IP.com Disclosure Number: IPCOM000117097D
Original Publication Date: 1995-Dec-01
Included in the Prior Art Database: 2005-Mar-31
Document File: 2 page(s) / 57K

Publishing Venue

IBM

Related People

Mckean, DR: AUTHOR [+4]

Abstract

Current methods of photodefining waveguides for non-linear optical applications include those which involve the photodestruction of NLO chromophores contained in the polymer matrix. These suffer from the disadvantage of incomplete removal of all of the chromophore in the irradiated areas as well as the requirement of long irradiation times. Examples of NLO waveguide generation using this photodestructive technique are found in (1,2). Our strategy involves the opposite and novel "in-situ" generation of the active chromophore and is based on the widely known chemistry employed in high resolution DUV photoresist technology (3). This approach offers several advantages over the current technology as listed below: 1.

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NLO Chromophore Generation for Active Waveguide Applications

      Current methods of photodefining waveguides for non-linear
optical applications include those which involve the photodestruction
of NLO chromophores contained in the polymer matrix.  These suffer
from the disadvantage of incomplete removal of all of the chromophore
in the irradiated areas as well as the requirement of long
irradiation times.  Examples of NLO waveguide generation using this
photodestructive technique are found in (1,2).  Our strategy involves
the opposite and novel "in-situ" generation of the active chromophore
and is based on the widely known chemistry employed in high
resolution DUV photoresist technology (3).  This approach offers
several advantages over the current technology as listed below:
  1.  The active chromophore is generated only in the waveguide,
       consequently even if the photoreaction is incomplete no active
       chromophore is formed in other parts of the film.
  2.  This photogeneration technique inherently leads to differences
in
       refractive index and better lithographic contrast and thus
better
       edge definition in the active waveguide.  In addition the
       birefringence induced in the exposed regions by poling will
       augment the refractive index difference for the desired
       polarization of light.
  3.  Depending on the specific chemistry employed, the lithographic
       sensitiv...