Browse Prior Art Database

Sputter Target Design for Reduced Particulate Generation

IP.com Disclosure Number: IPCOM000117144D
Original Publication Date: 1995-Jun-01
Included in the Prior Art Database: 2005-Mar-31
Document File: 2 page(s) / 32K

Publishing Venue

IBM

Related People

Walker, GG: AUTHOR [+2]

Abstract

A sputter target design is disclosed which significantly reduces the number of particulates generated during extended target usage.

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Sputter Target Design for Reduced Particulate Generation

      A sputter target  design is disclosed which significantly
reduces the number of particulates generated during extended target
usage.

      One widely-used target design in disk sputter systems and the
improved target design are illustrated in the Figure.  Particulates
are introduced into the sputter system by the delamination of
redeposited material outside of the active erosion zone of the
sputter target.  The effect of the modified target design is twofold:
1) it eliminates the redeposited zone by moving the grounded anode
and ground shields over the region of the target which is not
actively sputtered and 2) less sputtered target material is collected
by the anode and ground shields because they are located below the
top surface of the sputter target.  With this improved target design
improved product yield and reliability are obtained.