Browse Prior Art Database

Rotational Radiative Oven-Type Dual-Element Heater Design

IP.com Disclosure Number: IPCOM000117217D
Original Publication Date: 1996-Jan-01
Included in the Prior Art Database: 2005-Mar-31
Document File: 2 page(s) / 82K

Publishing Venue

IBM

Related People

Crockett, J: AUTHOR [+3]

Abstract

Disclosed is a two inch diameter rotational radiative oven-type dual element heater capable of operating in corrosive environments from vacuum to atmospheric pressure at elevated temperatures above 800 degrees C. Unlike the single element designs (1,2), this heater has a dual element construction. One element is embedded on the top side, in a serpentine pattern. The other element is embedded on the back side, rotated 90 degrees. from the top element direction in a serpentine pattern. The basic heater hardware is described elsewhere (1). It has been determined that the use of silver-tungsten bearings outlasts its conventional stainless steel counterparts. This improvement has been successful by providing a smooth (non-galling) rotation of the wafer at elevated process temperatures.

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Rotational Radiative Oven-Type Dual-Element Heater Design

      Disclosed is a two inch diameter rotational radiative oven-type
dual element heater capable of operating in corrosive environments
from vacuum to atmospheric pressure at elevated temperatures above
800 degrees C.  Unlike the single element designs (1,2), this heater
has a dual element construction.  One element is embedded on the top
side, in a serpentine pattern.  The other element is embedded on the
back side, rotated 90 degrees.  from the top element direction in a
serpentine pattern.  The basic heater hardware is described elsewhere
(1).  It has been determined that the use of silver-tungsten bearings
outlasts its conventional stainless steel counterparts.  This
improvement has been successful by providing a smooth (non-galling)
rotation of the wafer at elevated process temperatures.

      Uniform temperature localization is accomplished because of the
criss-cross wire box heat pattern.  This criss-cross wire box
arrangement heats the 2 inch diameter wafers uniformly over a
one-quarter inch square box area unlike the first single element
design (1).  In that design, a quarter inch box by 2 inch long open
ended box resulted from the single wire serpentine arrangement.
Therefore, installing a second heating element, the box is now square
and closed ended.  Each subsequent quarter inch box heats the same
and ten boxes square makes up the local heat grid area.  This grid is
required to heat the entire 2 inch diameter wafer uniformly.  It
gives a uniform temperature gradient across the surface of the wafer
at the 760 degrees C deposition temperature.  The temperature of the
heated surface, which is at the deposition temperature, across the 2
inch diameter wafer surface, varies by only +/- 5ºC.  The...