Browse Prior Art Database

Flaming the Clamp Ring at Deep Trench Etching Step to Reduce Contamination

IP.com Disclosure Number: IPCOM000117883D
Original Publication Date: 1996-Jul-01
Included in the Prior Art Database: 2005-Mar-31
Document File: 2 page(s) / 20K

Publishing Venue

IBM

Related People

Richard, M: AUTHOR [+2]

Abstract

At the deep trench dry etching step, a quartz clamp ring is usually used to maintain the resist patterned S/C wafer.

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This is the abbreviated version, containing approximately 100% of the total text.

Flaming the Clamp Ring at Deep Trench Etching Step to Reduce Contamination

      At the deep trench dry etching step, a quartz clamp ring is
usually used to maintain the resist patterned S/C wafer.

      Many times, it has been observed that the bottom surface of
the ring is rough.  This causes the resist layer to be removed when
the ring is unloaded, thus resulting in a damaged resist layer which
is a potential source of contamination.

      Therefore, it is proposed to flame-polish the quartz clamp
ring to smooth the bottom surface.  As a result, the resist layer is
no longer damaged, the contamination is significantly reduced and the
utilization time increased.