Browse Prior Art Database

Taper Angle Detection Method for Conductive Materials

IP.com Disclosure Number: IPCOM000118891D
Original Publication Date: 1997-Aug-01
Included in the Prior Art Database: 2005-Apr-01
Document File: 2 page(s) / 33K

Publishing Venue

IBM

Related People

Colgan, EG: AUTHOR [+4]

Abstract

Disclosed is a taper angle detection method for conductive materials in thin-film-transistor liquid crystal display, employing both electrical measurement methods of a capacitor line width detection and a resistor line width detection.

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Taper Angle Detection Method for Conductive Materials

      Disclosed is a taper angle detection method for conductive
materials in thin-film-transistor liquid crystal display, employing
both electrical measurement methods of a capacitor line width
detection and a resistor line width detection.

      Assuming that the taper line is straight as shown in Fig. 1,
subtracting the resistor line width X from the capacitor line width Y
yields a taper portion width of material A.  The taper height is
given by other measurement, therefore, the taper angle (theta) is
given (Fig. 2).  As shown in the Figure, the line width of the
conductive material A, using a resistor structure, is detected as an
average value  of upper side and bottom of the tapered shape.  On the
other hand, the  capacitor structure composed by material A, B, and
insulator film gives  the bottom width of the tapered shape.  The
taper height is given by step  height measurement or a laser
microscope.

      This detection method is a non-destructive inspection
method.  Therefore, the method can eliminate a destructive
inspection, such as a cross-sectional view inspection using a
scanning electron microscope.