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Browse Prior Art Database

T-BOC Positive Tone Alternate Developer

IP.com Disclosure Number: IPCOM000119869D
Original Publication Date: 1991-Mar-01
Included in the Prior Art Database: 2005-Apr-02
Document File: 2 page(s) / 82K

Publishing Venue

IBM

Related People

Merritt, DP: AUTHOR [+2]

Abstract

This article describes an additive to a positive tone t-Boc photoresist developer which eliminates existing skin and scum residue problems while increasing both its sensitivity and solubility, thereby reducing the required exposure dose and improving image profile.

This text was extracted from an ASCII text file.
This is the abbreviated version, containing approximately 88% of the total text.

T-BOC Positive Tone Alternate Developer

      This article describes an additive to a positive tone
t-Boc photoresist developer which eliminates existing skin and scum
residue problems while increasing both its sensitivity and
solubility, thereby reducing the required exposure dose and improving
image profile.

      T-Boc (p-tert-butoxycarbonyloxystyrene) resist achieves
lithographic properties by photo generation of a strong acid which,
with heat, initiates and catalyzes a side chain conversion of the
host polymer from the t-butylcarbonate group to a phenol group.
Isoprene and carbon dioxide gases are generated concurrent with this
reaction.  The lithographic pattern is essentially delineated by
exposed areas of parahydroxy-styrene and the corresponding original
"t-Boc" material.  Isopropyl alcohol (IPA) and water in 1:1
proportions, the present developer, does not leave a clean image
profile.  Fig. 1 indicates a ledge ("bread loaf appearance") to exist
at the top of the profile.  This ledge is believed due to an
insoluble top layer film or skin ( 200-300 angstroms in thickness)
that is left after development, together with a "scum-like" residue
on exposed substrate areas, and surface cracks.

      An additive to the present developer is here disclosed, which
eliminates the problems noted and, in addition, due to its
selectivity, improves the solubility and sensitivity of the
developer.  It consists of the addition of 2% anisole to the existing
1:1 isopr...