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Highly Reflective, Hard Amorphous Films of Aluminum Alloys

IP.com Disclosure Number: IPCOM000120043D
Original Publication Date: 1991-Mar-01
Included in the Prior Art Database: 2005-Apr-02
Document File: 1 page(s) / 43K

Publishing Venue

IBM

Related People

Cuomo, JJ: AUTHOR [+3]

Abstract

The recent discovery of amorphous alloys of aluminum with up to 96 atomic % Al have been produced by melt spinning techniques (*). We report on the successful fabrication of amorphous thin films of substantially aluminum alloys of the type Al1-x-yM(1)xM(2)y, where M(1) is a transition metal and M(2) is a rare earth.

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Highly Reflective, Hard Amorphous Films of Aluminum Alloys

      The recent discovery of amorphous alloys of aluminum with
up to 96 atomic % Al have been produced by melt spinning techniques
(*).  We report on the successful fabrication of amorphous thin films
of substantially aluminum alloys of the type Al1-x-yM(1)xM(2)y, where
M(1) is a transition metal and M(2) is a rare earth.

      These alloy films were deposited by RF sputtering onto a
variety of substrates at different substrate temperatures. We found
the films to be amorphous and specular at thicknesses greater than 1
mm and at temperatures in excess of 250oC.  This is a surprising
result in that crystalline films of aluminum at thicknesses greater
than 1000 o are hazy and cloudy even when deposited at liquid
nitrogen temperature.  Thick Al90Gd5Ni5 films (1 micron) deposited at
20oC were found to have a 50% higher reflectivity (in the visible
spectrum) than thin films (0.1 micron) of pure aluminum deposited at
-100oC.  The as-deposited resistivity of the Al90Gd5Ni5 films was 75
micro-ohm-cm.  The resistivity of these films drops to 10
micro-ohm-cm after a 30-minute anneal in nitrogen at 500oC, but the
films remain amorphous.

      We find these films to be useful as highly reflective coatings
for polymers, large objects such as telescope lenses, high rate high
production coatings where smooth shiny coatings are essential.
Higher processing temperatures, corresponding to high deposition
rates, are...