Dismiss
InnovationQ will be updated on Sunday, Oct. 22, from 10am ET - noon. You may experience brief service interruptions during that time.
Browse Prior Art Database

X-Ray Mask Fabrication

IP.com Disclosure Number: IPCOM000120191D
Original Publication Date: 1991-Mar-01
Included in the Prior Art Database: 2005-Apr-02
Document File: 1 page(s) / 41K

Publishing Venue

IBM

Related People

Cuomo, JJ: AUTHOR [+4]

Abstract

Disclosed is a process for depositing polycrystalline diamond films that are smooth enough for use as substrates for x-ray lithography masks.

This text was extracted from an ASCII text file.
This is the abbreviated version, containing approximately 89% of the total text.

X-Ray Mask Fabrication

      Disclosed is a process for depositing polycrystalline diamond
films that are smooth enough for use as substrates for x-ray
lithography masks.

      Diamond is an excellent substrate for x-ray lithography masks
because of its radiation hardness.  It has other desirable properties
for this application: high mechanical strength, optical and x-ray
transparency, chemical inertness, flatness and rigidity.  The use of
diamond as an x-ray mask material is now feasible due to recent
progress in its film deposition by plasma enhanced deposition
methods.  The substrates are frequently seeded with materials such as
diamond particles to increase the initial nucleation density.
Particle sizes of 10-30 mm that are usually used for enhanced
nucleation.  The problem with these processes is the tendency for
granular films to form due to both the low nucleation densities and
the growth kinetics.

      By using significantly smaller diamond seeds for the initial
nucleation, continuous polycrystalline diamond films coalesce at a
smaller thickness than with larger seeds. This results in smoother
films that are compatible with x-ray lithography.  Seed sizes of 0.1
mm have been used for this.  Also, by coating the substrate with a
thin metal film, such as W or Mo which form a carbide, the initial
nucleation rate is increased, thus decreasing the thickness at which
the film coalesces.  Metal films with thicknesses of 100-1000 Ao have
been used for t...