Browse Prior Art Database

Deposition of Metal Films With Controlled Roughness

IP.com Disclosure Number: IPCOM000120480D
Original Publication Date: 1991-Apr-01
Included in the Prior Art Database: 2005-Apr-02
Document File: 1 page(s) / 16K

Publishing Venue

IBM

Related People

Khandros, IY: AUTHOR [+4]

Abstract

Disclosed is a technique for fabricating metal films with controlled roughnesses or textures. A very thin film of Ga is evaporated under the actual metal film of interest. The roughness of the metal overlayer is extremely sensitive to the thickness of the underlying Ga deposit and can be controlled by adjusting the thickness of the Ga layer.

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Deposition of Metal Films With Controlled Roughness

      Disclosed is a technique for fabricating metal films with
controlled roughnesses or textures.  A very thin film of Ga is
evaporated under the actual metal film of interest.  The roughness of
the metal overlayer is extremely sensitive to the thickness of the
underlying Ga deposit and can be controlled by adjusting the
thickness of the Ga layer.

      Disclosed anonymously.