Browse Prior Art Database

High Accuracy Alignment Target

IP.com Disclosure Number: IPCOM000120529D
Original Publication Date: 1991-May-01
Included in the Prior Art Database: 2005-Apr-02
Document File: 1 page(s) / 17K

Publishing Venue

IBM

Related People

Brophy, D: AUTHOR [+5]

Abstract

Higher accuracy is obtained by adding a 2 to 4 mil center alignment target. This target is used for alignment in the film inspection mask manufacturing. The smaller target allows a higher magnification, resulting in more accuracy. ((Image Omitted)).

This text was extracted from an ASCII text file.
This is the abbreviated version, containing approximately 100% of the total text.

High Accuracy Alignment Target

      Higher accuracy is obtained by adding a 2 to 4 mil center
alignment target.  This target is used for alignment in the film
inspection mask manufacturing.  The smaller target allows a higher
magnification, resulting in more accuracy. (

                            (Image Omitted)

).