Browse Prior Art Database

Infrared/Plasma Resist Removal Process

IP.com Disclosure Number: IPCOM000120691D
Original Publication Date: 1991-May-01
Included in the Prior Art Database: 2005-Apr-02
Document File: 1 page(s) / 22K

Publishing Venue

IBM

Related People

Hess, DH: AUTHOR [+2]

Abstract

Disclosed is a process that will remove the bulk of the photoresist without the use of chemical stripping solutions. The photoresist is removed by exposure to high intensity medium wavelength (approximately 3 micron) infrared radiation. The process can easily be implemented on a conveyor system. This process leaves a small amount of residue which is removed by CF4/02 plasma cleaning step.

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Infrared/Plasma Resist Removal Process

      Disclosed is a process that will remove the bulk of the
photoresist without the use of chemical stripping solutions. The
photoresist is removed by exposure to high intensity medium
wavelength (approximately 3 micron) infrared radiation.  The process
can easily be implemented on a conveyor system.  This process leaves
a small amount of residue which is removed by CF4/02 plasma cleaning
step.

      In the figure, the part with the photoresist 1 is moved on a
conveyor belt or shuttle assembly 2 past a set of high intensity IR
lamps 3.  A housing 4 holds the lamp assembly in place and shields
the environment from the lamp radiation.

      Disclosed anonymously.