Browse Prior Art Database

Method of Avoiding Contamination in Laser Ablation of Polymers

IP.com Disclosure Number: IPCOM000120713D
Original Publication Date: 1991-May-01
Included in the Prior Art Database: 2005-Apr-02
Document File: 1 page(s) / 34K

Publishing Venue

IBM

Related People

Hodgson, RT: AUTHOR [+2]

Abstract

Disclosed is a method of preventing debris from byproducts of laser ablation of polymers such as polyimide from redepositing on the surface being ablated. It has been shown that the debris is electrically charged.

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This is the abbreviated version, containing approximately 100% of the total text.

Method of Avoiding Contamination in Laser Ablation of Polymers

      Disclosed is a method of preventing debris from byproducts of
laser ablation of polymers such as polyimide from redepositing on the
surface being ablated.  It has been shown that the debris is
electrically charged.

      In the case that the surface 1 is ablated by projection of the
laser light 2, image of a mask 3 is projected on the polymeric
material 4 through the lens 5.  The figure shows a sketch of a
configuration which would ensure that no debris lands on the part 4
being ablated. The surface 1 of the insulating polymer 4 is charged
by electron bombardment in a vacuum, or by corona discharge from a
wire 6.  In this way, the debris 7, which is normally charged both
positively and negatively, will be negatively charged and be
attracted to a grid 8 of positively charged wires held away from the
part. The grid 8 can be cleaned from time to time as is the grid
of an electrostatic precipitator, and the part 4 can proceed to the
next step without cleaning.

      Disclosed anonymously.