Browse Prior Art Database

Photoresist Shape Modification Etching of Metals

IP.com Disclosure Number: IPCOM000121000D
Original Publication Date: 1991-Jul-01
Included in the Prior Art Database: 2005-Apr-02
Document File: 2 page(s) / 177K

Publishing Venue

IBM

Related People

Albrechta, S: AUTHOR [+4]

Abstract

Disclosed is a method of enhancing photomask features to provide an optimized final etched shape in metals.

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Photoresist Shape Modification Etching of Metals

      Disclosed is a method of enhancing photomask features to
provide an optimized final etched shape in metals.

      As geometries shrink, it is increasingly difficult to reproduce
the photolithographic image in the final etched part.  In the
technique described herein, the photomask used to provide the resist
etch mask was modified to compensate for degraded etching at sharp
cornered areas.  Fig. 1 shows the types of mask modifications which
were evaluated.  The 1 mil (on-a-side) square edge corner addition
proved to work best for the geometries involved.  The
photomicrographs (Fig. 2) of the parts produced with the standard and
modified artwork demonstrate the improved etched shapes.