Browse Prior Art Database

Photoresist Filtering System Using Two Step Filtering

IP.com Disclosure Number: IPCOM000121519D
Original Publication Date: 1991-Sep-01
Included in the Prior Art Database: 2005-Apr-03
Document File: 2 page(s) / 40K

Publishing Venue

IBM

Related People

Ikenouchi, K: AUTHOR

Abstract

Disclosed is a photoresist filtering system which includes coarse and fine filter stages for efficient removal of particles from the resist.

This text was extracted from an ASCII text file.
This is the abbreviated version, containing approximately 100% of the total text.

Photoresist Filtering System Using Two Step Filtering

      Disclosed is a photoresist filtering system which
includes coarse and fine filter stages for efficient removal of
particles from the resist.

      Photoresist may contain particles which result in defects in
integrated circuit devices manufactured by the photo-process.  Such
particles should be removed from the resist to manufacture high
quality devices and to increase manufacturing yield.

      In the figure, the system includes five sections: material
section 10, pump section 12, filter section 14, supply section 16,
and control section 18.  Material bottles which include photoresist
to be filtered are placed in the material section 10.  The resist is
supplied from the section 10 to the filter section 14 by a pump in
the pump section 12.  The filter section 14 includes two pressure
sensors PS1 snd PS2 which detect pressure of the resist to control
resist flow.  The section 14 also includes coarse filter F1 and fine
filter F2 which provide, in combination, an efficient and high
quality filtering operation.  The filtered resist is supplied to the
supply section 16.

      The system may have additional control means such as
temperature sensors which could monitor resist temperature to stop
the system at abnormal temperatures, and resist presence/absence
sensors which may be provided near the filters for venting.