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Nozzle for Liquid Application

IP.com Disclosure Number: IPCOM000121543D
Original Publication Date: 1991-Sep-01
Included in the Prior Art Database: 2005-Apr-03
Document File: 2 page(s) / 48K

Publishing Venue

IBM

Related People

Hayashi, T: AUTHOR [+4]

Abstract

Disclosed is a nozzle for appplying flux thinly and uniformly. This nozzle has no pool for flux inside, as shown in Fig. 1, and its nozzle entrance 2 is directly connected to nozzle hole 4 which extends to nozzle surface 6. So, flux supplied to the nozzle entrance 2 comes out directly from the hole 4.

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Nozzle for Liquid Application

      Disclosed is a nozzle for appplying flux thinly and
uniformly.  This nozzle has no pool for flux inside, as shown in Fig.
1, and its nozzle entrance 2 is directly connected to nozzle hole 4
which extends to nozzle surface 6.  So, flux supplied to the nozzle
entrance 2 comes out directly from the hole 4.

      Prior nozzles have a pool for flux 8 inside, as shown in Fig.
3.  Usually a fixed quantity of flux is sent to the nozzle entrance 2
as by a dispenser.  Flux is fed from nozzle holes 10 through the pool
of flux.  However, if there is air in the pool, a fixed quantity of
flux cannot be constantly dispensed from the nozzle hole 10,
resulting in variations in application area and film thickness.

      The present nozzle has no pool of flux and therefore enables a
fixed quantity of flux to be constantly supplied from the nozzle
holes.  It is possible to apply flux uniformly and thinly less than
80 microns.

      Fig. 2 shows the operation of the nozzle in Fig. 1, and Fig. 4
shows the operation of the prior nozzle in Fig. 3.