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Magnetron Racetrack Shaper

IP.com Disclosure Number: IPCOM000121658D
Original Publication Date: 1991-Sep-01
Included in the Prior Art Database: 2005-Apr-03
Document File: 2 page(s) / 62K

Publishing Venue

IBM

Related People

Wahrhusen, J: AUTHOR

Abstract

This article describes a special type of racetrack shaper for magnetron rotary table sputter equipment.

This text was extracted from an ASCII text file.
This is the abbreviated version, containing approximately 97% of the total text.

Magnetron Racetrack Shaper

      This article describes a special type of racetrack shaper
for magnetron rotary table sputter equipment.

      A diagrammatic view of the arrangement of the racetrack shaper
within the sputter equipment is shown in Fig. 1.  The shape of the
apertures is shown in Fig. 2.

      Shapers are plates with specially formed apertures, which for
sputter deposition processes in rotary table equipment are used for
circular sputter targets to optimize the layer thickness
distribution.  The layer thickness distribution obtainable during
such processes depends on the shape of the target, the radius of
rotation of the respective substrate point on the table, the process
parameters (pressure, power, bias), the geometrical conditions, and
potential magnetron magnetic fields.

      The apertures in the shaper used for rotary table sputter
equipment and circular targets should be shaped such that the
magnetron racetrack zone is preferably used for coating.  As shown in
particular in Fig. 2, the shaper apertures are formed in the zone of
the plasma reinforced by the magnetron effect (electron racetrack) to
prevent parts of the racetrack zone from being masked by the shaper.

      Used in conjunction with magnetron deposition processes, the
racetrack shaper has the following advantages:
      o    Better distribution (layer resistance/layer thickness)
than with state-of-the-art flower-vase shapers.
      o    (20%) lower...