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Browse Prior Art Database

Micromachine Transfer Belt

IP.com Disclosure Number: IPCOM000121729D
Original Publication Date: 1991-Sep-01
Included in the Prior Art Database: 2005-Apr-03
Document File: 2 page(s) / 76K

Publishing Venue

IBM

Related People

Cronin, JE: AUTHOR [+2]

Abstract

A method is shown for utilizing semiconductor chip mandrel and spacer process technology to form a micromachine transfer belt.

This text was extracted from an ASCII text file.
This is the abbreviated version, containing approximately 65% of the total text.

Micromachine Transfer Belt

      A method is shown for utilizing semiconductor chip
mandrel and spacer process technology to form a micromachine transfer
belt.

      Conventional power equipment utilizes gears, belts, direct
drive, rack and pinion, etc., as a means for transferring motion.
Chip mandrel and spacer technology can be used to fabricate a
micromachine transfer belt.

      Referring to Fig. 1, a drive motor hub and a transfer drive hub
are shown with a polysilicon, nitride or other metal projecting above
the motor rotor and transfer drive base surface. The mandrel is made
by applying resist which is planarized back, exposed, and developed
in a shape smoothly connecting the two hubs. Note that the resist is
developed partially back. A poly(chloro-para-xylyene) (PPX) conformal
material is then deposited to form the spacer/belt and is reactive
ion etched (RIE) back to form a belt. Finally, the resist is wet
stripped away.

      Options and modifications to the basic form include the
following:
     1) If control of planarization, image size, or partial develop
back become problems, a mandrel fabricated with spun-on glass or
polyimide may be used. The mandrel is planarized to the hubs, and
resist is applied over the mandrel to image and mask the smoothly
connected area. The mandrel is then partially etched, PPX spacers
defined, and mandrel removed.
     2) If the PPX spacers become bound to the hubs, a thin spacer
(metal or insulator) is de...