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Wafer Dosimeter Using Radiachromic Resist

IP.com Disclosure Number: IPCOM000121741D
Original Publication Date: 1991-Sep-01
Included in the Prior Art Database: 2005-Apr-03
Document File: 2 page(s) / 66K

Publishing Venue

IBM

Related People

Hoffman, Jr SR: AUTHOR [+4]

Abstract

Radiachromic dye incorporated in a resist and coated directly on a semiconductor wafer is useful for dosimetry.

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Wafer Dosimeter Using Radiachromic Resist

      Radiachromic dye incorporated in a resist and coated
directly on a semiconductor wafer is useful for dosimetry.

      Currently, X-ray beam dose is measured using commercially
available dosimetry film which is taped to a wafer and exposed on a
X-ray stepper. This procedure threatens the survival of the fragile
X-ray membrane mask which is held in close proximity to the wafer.
Also, if the film slips from the vertically clamped wafer, severe
problems may result. Further, the dosimetry film does not provide
detailed information on dose uniformity across the exposure field. A
more accurate means for determining X-ray dosage is the use of
radiachromic dyes incorporated in the resist material.

      The triphenylmethane dyes are radiachromic materials that, when
subjected to radiation, undergo unimolecular decomposition and change
from colorless to colored compounds. The intensity of the color is
directly proportional to the amount of radiation exposure and can be
monitored with an optical densitometer or small-spot spectrometer.
Several of the aminotriphenyl methane nitriles are listed below.

      NAME                          COLOR               WAVELENGTH
(nm)
Hexa(hydroxyethyl)                  Blue               605, 510,  360
pararosaniline cyanide
New fuchsin cyanide                 Violet             560, 510,  360
Malachite green                     Green              627, 430
Pararosaniline                      Red                549
Several factors make these compounds ideal for dosim...