Browse Prior Art Database

Method of Cleaning Silicon Wafers

IP.com Disclosure Number: IPCOM000121982D
Original Publication Date: 1991-Oct-01
Included in the Prior Art Database: 2005-Apr-04
Document File: 1 page(s) / 33K

Publishing Venue

IBM

Related People

Vollmer, S: AUTHOR

Abstract

The disclosed method serves to clean silicon wafers by means of DI water. Schematic sectional views of the equipment used for this purpose are shown in the figure.

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Method of Cleaning Silicon Wafers

      The disclosed method serves to clean silicon wafers by
means of DI water.  Schematic sectional views of the equipment used
for this purpose are shown in the figure.

      Silicon wafers 2, positioned vertically in a carrier 1, are
placed in a suitable tank 3.  Rollers 5,  driven by a motor 4, are
arranged below silicon wafers 2.  Rollers 5 lift wafers 2 from
carrier 1 and permit them to rotate at several revolutions per
minute.  Above silicon wafers 2, a jet assembly 6 comprising a number
of conical spray jets 7 is positioned, by means of which the DI water
is directed vertically downwards.  The DI water is supplied via a
source and an inlet control unit 8 fitted with pressure gauges,
control valves, flow control means and filters.  Tank outlet 9 to the
drain must be adequately dimensioned for discharging the DI water
used for cleaning.

      Optimum cleaning results are obtained by a suitable sequence of
high- and low-pressure steps.